Patent Law, Appropriability, and External R&D: Empirical Evidence

Yun Hou, I. Png, X. Xiong
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Abstract

Theoretically, whether technology firms should increase external R&D in response to stronger patent law depends on the effects of law on returns to external and internal R&D. Exploiting geographical differences in the strengthening of patent protection due to the U.S. Court of Appeals for the Federal Circuit, we find that, on average, external R&D increased by 42.3 percent. The effect was more pronounced among companies less intensive in manufacturing, smaller in scope, and in complex-technology and more geographically concentrated industries, and those where patents were less effective in appropriability.
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专利法、适格性与外部研发:经验证据
理论上,技术公司是否应该增加外部研发以应对更强的专利法,取决于法律对外部研发和内部研发回报的影响。利用美国联邦巡回上诉法院在加强专利保护方面的地域差异,我们发现,平均而言,外部研发增加了42.3%。这种影响在制造业集中度较低、规模较小、技术复杂、地域集中度较高的行业,以及专利适用效率较低的企业中更为明显。
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