The characterization of misfit dislocations at {100} heterojunctions in III–V compound semiconductors

B.C. De Cooman, C.B. Carter, Kam Toi Chan, J.R. Shealy
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引用次数: 22

Abstract

Strain localization at near-lattice-mismatched (100) semiconductor heterojunctions results in the formation of dislocations due to plastic deformation of the epilayer at low temperatures. A geometric model for this deformation has been presented which predicts the main features of these dislocation arrays at the heterojunction. In a full analysis of these dislocations, both the dissociated nature of the dislocations and their αβcharacter must be taken into account. The model has been tested by analyzing the arrangement and character of dislocations present in (Ga,In)As/GaAs and (Ga, In)P/GaAs heterostructures. It is shown that the dislocations geometries differ significantly depending on whether the epilayer was in tension or compression during growth.

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III-V型化合物半导体{100}异质结错配位错的表征
在近晶格错配(100)半导体异质结处的应变局域化导致由于薄膜在低温下的塑性变形而形成的位错。提出了这种变形的几何模型,该模型预测了异质结处这些位错阵列的主要特征。在对这些位错的全面分析中,必须考虑到位错的解离性质和它们的αβ特征。通过分析(Ga, in)As/GaAs和(Ga, in)P/GaAs异质结构中位错的排列和特征,对该模型进行了验证。结果表明,脱毛层在生长过程中是处于拉伸状态还是压缩状态,其位错几何形状有显著差异。
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