Improvement of Saturation Magnetization of Sputtered Fe/Al Multilayer Thin Films Using Taguchi Method Supported by ANOVA, Response Surface Methodology and Regression Analysis

IF 0.5 4区 物理与天体物理 Q4 PHYSICS, MULTIDISCIPLINARY Acta Physica Polonica A Pub Date : 2023-05-01 DOI:10.12693/aphyspola.143.381
Hakan Köçkar, N. Kaplan, A. Karpuz, O. Karaagac
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Abstract

Taguchi method has been conducted to improve the saturation magnetisation, M s , of Fe/Al multilayer thin films deposited using a dual-target magnetron sputtering. The M s values were obtained from the magnetic hysteresis loops. To evaluate the influence of deposition factors on M s by using the Taguchi method, L9 orthogonal array with three deposition factors (A — Fe deposition rate, B — Al deposition rate, and C — Fe layer thickness) was carried out with nine experiments at three levels. For the signal-to-noise ratio of the “larger is the better”, the improved M s has been obtained at A3B2C3, where factor A is 0.12 nm/s, factor B is 0.03 nm/s, and factor C is 25 nm. At A3B2C3, a verification experiment was carried out with a 95% confidence level to confirm the prediction of 1597.6 emu/cm 3 , and in the experimental run, M s, exp was found to be 1649.0 emu/cm 3 , which was an improvement from the highest initial run, i.e., M s, ini = 1 540.2 emu/cm 3 , among prescribed runs. Analysis of variance was imposed to obtain the F-ratio and contribution percentage of each deposition factor. Also, the interactions of the deposition factors were determined with response surface methodology. For the structural properties at the best factor combinations, X-ray diffraction experiments revealed that Fe/Al films at A3B2C3 were crystallised with the mixed phase of face-centred cubic and body-centred cubic structures. According to scanning electron microscope images, the film surface is almost uniformly shaped. Furthermore, the model of M s has also been developed using regression analysis as a function of the deposition factors A, B, and C. Then, from the regression model, high statistical performance was obtained, with values of R 2 and R 2 (adj) being 100 and 100%, respectively. It is seen that the Taguchi method supported by response surface methodology, analysis of variance, and regression analysis turned out to be very successful in finding the factors with proper levels in order to improve M s of Fe/Al multilayer thin fims within the prescribed limit.
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利用方差分析、响应面法和回归分析支持的田口法提高溅射Fe/Al多层薄膜的饱和磁化强度
采用田口法提高了双靶磁控溅射制备的Fe/Al多层薄膜的饱和磁化强度。由磁滞回线得到M s值。为了利用田口法评价沉积因子对M - s的影响,采用L9正交阵列对3个沉积因子(A - Fe沉积速率、B - Al沉积速率和C - Fe层厚度)进行了3个水平的9个实验。对于信噪比“越大越好”,在A3B2C3得到了改进的M s,其中因子A为0.12 nm/s,因子B为0.03 nm/s,因子C为25 nm。在A3B2C3进行了95%置信水平的验证实验,证实了预测值为1597.6 emu/cm 3,在实验运行中,M s, exp为1649.0 emu/cm 3,比规定运行中的最高初始运行M s, ini = 1 540.2 emu/cm 3有所提高。方差分析得到各沉积因子的f比和贡献率。同时,用响应面法测定了各沉积因子之间的相互作用。对于最佳因子组合下的结构性能,x射线衍射实验表明,A3B2C3的Fe/Al薄膜结晶为面心立方结构和体心立方结构的混合相。从扫描电镜图像来看,薄膜表面的形状几乎是均匀的。此外,还利用回归分析建立了M s作为沉积因子a、B、c的函数模型,从回归模型中获得了较高的统计性能,r2和r2 (adj)分别为100和100%。结果表明,响应面法、方差分析和回归分析支持的田口法能够很好地找到适当水平的因素,从而使Fe/Al多层薄膜的M s在规定的范围内得到提高。
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来源期刊
Acta Physica Polonica A
Acta Physica Polonica A 物理-物理:综合
CiteScore
1.50
自引率
0.00%
发文量
141
审稿时长
6 months
期刊介绍: Contributions which report original research results and reviews in the fields of General Physics, Atomic and Molecular Physics, Optics and Quantum Optics, Quantum Information, Biophysics, Condensed Matter, and Applied Physics are welcomed.
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