Thermal stability of chemically bonded phases on silica gel by photoacoustic FT-IR spectroscopy

A. Kierys, S. Pasieczna, J. Ryczkowski, J. Goworek
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引用次数: 3

Abstract

The temperature resistance of chemically bonded phases on commercial silica gel. LiChrosorb RP 2, RP 8, RP 18 and unmodified Si 60 were tested at different temperatures by photoacoustic FT-IR spectroscopy. The surface characteristics and possible degradation of hydrocarbon phase at higher temperatures were investigated by means of FT-IR/PAS technique. For a series of investigated samples heated up to 423K, the FT-IR/PAS spectra are similar to those for initial silica samples. The most characteristic band for alkyl modified silica gel, i.e., RP 2, RP 8, and RP 18 was observed between 3200 cm-1 to 2800 cm-1 corresponding to various hydrocarbon species. The bands at 3745 cm-1, 3650 cm-1, and 3430 cm-1 observed in the photoacoustic FT-IR spectra may be ascribed to isolated silanol groups (Si-OH), geminal groups (si-(OH) 2 ) and hydrogen-bonded Si-OH groups, respectively. For all samples the intensity of the broad band in the region 3800 cm-1 to 3200 cm-1 decreases with the increasing temperature. The additional peak at 3745 cm-1 for chemically bonded long hydrocarbon chain, i.e., C18 and C8 after thermal treatment at 573 K is observed.
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利用光声傅里叶红外光谱研究硅胶上化学键合相的热稳定性
商用硅胶的化学键合相的耐温性能。采用光声傅里叶红外光谱(FT-IR)技术,对不同温度下的生津剂RP 2、RP 8、RP 18和未改性的Si 60进行了测试。利用FT-IR/PAS技术研究了其表面特征及高温下烃类相的降解可能性。对于加热到423K的一系列样品,FT-IR/PAS光谱与初始二氧化硅样品相似。在3200 cm-1 ~ 2800 cm-1范围内,烷基改性硅胶的rp2、rp2、rp2和rp2最具特征。光声FT-IR光谱在3745 cm-1、3650 cm-1和3430 cm-1处观察到的条带可能分别属于分离的硅醇基(si- OH)、双元基(si-(OH) 2)和氢键si- OH基团。所有样品在3800 cm-1 ~ 3200 cm-1区域的宽带强度随温度升高而降低。573 K热处理后,化学键长烃链C18和C8在3745 cm-1处有附加峰。
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