Electrochemical and X-ray photoelectron spectroscopy investigation into anodic behaviour of electroless Ni–9·5 wt-%P in acidic chloride environment

B. Bozzini, C. Lenardi, M. Serra, A. Fanigliulo
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引用次数: 19

Abstract

Abstract This paper reports on the anodic behaviour of as plated (X-ray amorphous) and heat treated (crystalline) high P electroless Ni-P deposits investigated by potentiodynamic and potentiostatic methods in acidic aqueous chloride solutions. Potentiodynamic measurements show an active-passive behaviour for both structures. The valence of P dissolution was assessed by the weight loss v. charge technique; dissolution valences do not correlate clearly with potentiodynamic behaviour. This can nevertheless be clearly interpreted in terms of ex situ X-ray photoelectron spectroscopy analyses of attacked layer composition; the layers formed at lower anodic potential within the passive range consist of NiO, the ones obtained at high anodic polarisation contain phosphate. Differences in anodic behaviour of as plated and heat treated specimens can be explained in terms of the defectiveness of protective NiO layers as a function of grain boundaries emerging at the surface.
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化学镀镍- 9.5 wt-%P在酸性氯化物环境中阳极行为的电化学和x射线光电子能谱研究
用动电位法和恒电位法研究了高磷电镀(x射线非晶)和热处理(结晶)Ni-P化学镀层在酸性氯化物水溶液中的阳极行为。动电位测量显示了这两种结构的主动-被动行为。用失重电荷法测定P的溶解价态;溶出价与电位动力学行为没有明显的相关性。然而,这可以用攻击层成分的非原位x射线光电子能谱分析来清楚地解释;在钝化范围内,低阳极电位形成的层由NiO组成,高阳极极化形成的层含有磷酸盐。电镀和热处理试样阳极行为的差异可以用保护NiO层的缺陷作为表面晶界出现的函数来解释。
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