{"title":"Electromigration activation energy in pure aluminum films deposited by partially ionized beam technique","authors":"O.V. Kononenko, E.D. Ivanov, V.N. Matveev, I.I. Khodos","doi":"10.1016/0956-716X(95)00450-A","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":101150,"journal":{"name":"Scripta Metallurgica et Materialia","volume":"33 12","pages":"Pages 1981-1986"},"PeriodicalIF":0.0000,"publicationDate":"1995-12-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0956-716X(95)00450-A","citationCount":"12","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Scripta Metallurgica et Materialia","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0956716X9500450A","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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