Giant Piezoelectric Properties of ZnO Film Doped with Acceptor-Donor Ionic Pair

Chang Gao, Yu Zhao, Weili Li, Yulong Qiao, Wang Zhao, Lu Jing, J. Sheng, W. Fei
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Abstract

Piezoelectric thin film materials are high energy density materials that scale very favorably upon miniaturization and that has led to an ever-growing interest for MEMS applications. Thus extensive investigation of lead-free piezoelectric has been triggered out of environmental awareness. Here, a concrete lead-free paradigm is presented, Zn1-2x(FexLix)O thin films, which exhibits a splendid d33* value (~415 pm/V) and electrostrain (~0.68%) after thermal-electric treatment in the co-doped film with the x value of 0.06. It is considered that the local lattice distortion generated by preferential distributed Fe3+-Li+ ionic pairs is responsible for the outstanding piezoelectric properties and obvious ferroelectricity response. The defect engineering strategy presented in this work open a new development window for obtaining excellent piezoelectricity in a wide range of binary metal oxide systems and have profound implications for the potential utilization of lead-free piezoelectrics in microelectromechanical systems and surface acoustic wave devices.
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受体-供体离子对掺杂ZnO薄膜的巨压电性能
压电薄膜材料是一种高能量密度的材料,具有非常有利的微型化特性,因此对MEMS应用的兴趣日益浓厚。因此,出于环保意识,无铅压电材料引发了广泛的研究。本文提出了一种具体的无铅模式,即Zn1-2x(FexLix)O薄膜,在x值为0.06的共掺杂薄膜中进行热电处理后,表现出良好的d33*值(~415 pm/V)和电应变(~0.68%)。认为Fe3+-Li+离子对优先分布所产生的局域晶格畸变是优异的压电性能和明显的铁电响应的原因。本工作提出的缺陷工程策略为在广泛的二元金属氧化物体系中获得优异的压电性打开了新的发展窗口,并对无铅压电材料在微机电系统和表面声波器件中的潜在应用具有深远的意义。
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