Impact of the phosphorus concentration on the morphological and corrosion behaviour of Ni-P, Co-P and Co-Ni-P electrodeposits

Y. Messaoudi, H. Belhadj, M. R. Khelladi, A. Redjechta, A. Azizi
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Abstract

ABSTRACT This work reports the results of a study on the effect of NaH2PO2 concentration as a phosphorus source on the properties of the Ni-P, Co-P and Co-Ni-P electrodeposits compared to Ni, Co and Co-Ni deposits. Binary and ternary alloys were electrodeposited from sulphate baths without additives at room temperature. The elementary analysis of the alloys determined by X-ray fluorescence spectroscopy (XRF) confirms the induced deposition type of the P with Ni and Co; where the P content depends strongly on the operational conditions. Morphological investigation conducted by atomic force microscopy (AFM) and scanning electron microscopy (SEM) shows that the addition of P has a smoothing effect on the Ni-based deposits and a magnification effect on the Co-based deposits. X-ray diffraction (XRD) analysis reveals that the deposits have a crystalline structure for deposits with low P content (< 11 wt-%) and amorphous structure for deposits with high P content. The incorporation of P atoms into the deposits has significantly improved their corrosion resistance according to the corrosion parameters determined by Tafel plot analysis.
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磷浓度对Ni-P、Co-P和Co-Ni-P镀层形貌和腐蚀行为的影响
本文报道了NaH2PO2浓度作为磷源对Ni- p、Co- p和Co-Ni- p镀层性能影响的研究结果,并与Ni、Co和Co-Ni镀层进行了比较。在室温下,从无添加剂的硫酸盐浴中电沉积二元和三元合金。用x射线荧光光谱(XRF)对合金进行元素分析,证实了P与Ni和Co的诱导沉积类型;其中P含量很大程度上取决于操作条件。通过原子力显微镜(AFM)和扫描电镜(SEM)进行的形貌研究表明,P的加入对镍基镀层有平滑作用,对钴基镀层有放大作用。x射线衍射(XRD)分析表明,P含量较低(< 11wt -%)的沉积层呈结晶结构,P含量较高的沉积层呈非晶结构。根据Tafel图分析确定的腐蚀参数,P原子的掺入显著提高了镀层的耐蚀性。
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