Technology development for space based Vortex Coronagraphy

E. Serabyn, D. Mawet
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引用次数: 3

Abstract

As demonstrated recently at the Palomar Observatory, the Optical Vortex Coronagraph (OVC) can enable high-contrast imaging observations very near bright stars. A small-angle observational capability is especially important because it can reduce the telescope diameter needed for close companion observations. However, as the OVC is a fairly new technique, the vortex phase masks needed to enable the very high contrast imaging required to detect terrestrial exoplanets (~ 10-10 relative to the host star) are not yet in hand. This paper thus first briefly describes the basic operation of the vortex coronagraph, and then turns to a discussion of a promising method of manufacturing the needed vortex masks. In particular, vortex phase masks based on circularly-symmetric half-wave plates made of liquid-crystal polymers have already achieved very good performance. The practical limitations of such masks, and the means of overcoming these limitations are also addressed. Successful development of the requisite vortex masks could potentially enable a range of high-contrast coronagraphic space missions, from an initial explorer class mission to a large flagship class exoplanet imaging mission.
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天基涡旋日冕技术发展
正如最近在帕洛玛天文台所展示的那样,光学涡旋日冕仪(OVC)可以在非常接近明亮恒星的地方进行高对比度的成像观测。小角度观测能力尤其重要,因为它可以减少近距离伴星观测所需的望远镜直径。然而,由于OVC是一项相当新的技术,旋涡相位掩模需要实现探测类地系外行星所需的高对比度成像(相对于主星~ 10-10),目前还没有。因此,本文首先简要介绍了涡旋日冕仪的基本工作,然后讨论了制造所需涡旋掩模的一种有前途的方法。特别是基于液晶聚合物的圆对称半波片的涡相掩模已经取得了很好的性能。还讨论了这种口罩的实际局限性以及克服这些局限性的方法。成功开发必要的旋涡掩膜可能会使一系列高对比度日冕空间任务成为可能,从最初的探索者级任务到大型旗舰级系外行星成像任务。
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