K. Abe, S. Yoshihara, J. Ohara, Y. Takeuchi, N. Kawahara
{"title":"A New Fabrication Method of Ultra-Small Laser Scanning Module","authors":"K. Abe, S. Yoshihara, J. Ohara, Y. Takeuchi, N. Kawahara","doi":"10.1109/SENSOR.2007.4300655","DOIUrl":null,"url":null,"abstract":"We report for the first time that an ultra-small laser scanning module of millimeter size has been realized. We have demonstrated electronic scanning by switching the current without any moving parts. Having no moving parts enables high reliability, and the system volume can be greatly reduced. This fabrication technology that we employed enables very precise mass production of micro-optical elements such as prisms, lenses and light waveguides, because all fabrication steps are carried out using the same semiconductor process. These micro-optical elements are formed on the substrate simultaneously using single etching mask.","PeriodicalId":23295,"journal":{"name":"TRANSDUCERS 2007 - 2007 International Solid-State Sensors, Actuators and Microsystems Conference","volume":"60 1","pages":"2405-2408"},"PeriodicalIF":0.0000,"publicationDate":"2007-06-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"TRANSDUCERS 2007 - 2007 International Solid-State Sensors, Actuators and Microsystems Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SENSOR.2007.4300655","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
We report for the first time that an ultra-small laser scanning module of millimeter size has been realized. We have demonstrated electronic scanning by switching the current without any moving parts. Having no moving parts enables high reliability, and the system volume can be greatly reduced. This fabrication technology that we employed enables very precise mass production of micro-optical elements such as prisms, lenses and light waveguides, because all fabrication steps are carried out using the same semiconductor process. These micro-optical elements are formed on the substrate simultaneously using single etching mask.