{"title":"Preparation and structural characteristics of ZrT4 thin films by plasma enhanced chemical vapor deposition","authors":"W. Lee, O. Yang","doi":"10.1023/B:JMSL.0000004647.81141.C3","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":16230,"journal":{"name":"Journal of Materials Science Letters","volume":"16 1","pages":"1679-1680"},"PeriodicalIF":0.0000,"publicationDate":"2003-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science Letters","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1023/B:JMSL.0000004647.81141.C3","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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