T. Yatsui, W. Nomura, M. Ohtsu, K. Hirata, Y. Tabata
{"title":"Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing","authors":"T. Yatsui, W. Nomura, M. Ohtsu, K. Hirata, Y. Tabata","doi":"10.1109/CLEO.2008.4551310","DOIUrl":null,"url":null,"abstract":"We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, <i>R</i> <sub>a</sub>, and the dispersion of <i>R</i> <sub>a</sub>.","PeriodicalId":6382,"journal":{"name":"2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science","volume":"15 1","pages":"1-2"},"PeriodicalIF":0.0000,"publicationDate":"2008-05-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CLEO.2008.4551310","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, Ra, and the dispersion of Ra.
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