Positron Spectroscopy of Boron Carbide Containing Metal Impurity

Chan Liu
{"title":"Positron Spectroscopy of Boron Carbide Containing Metal Impurity","authors":"Chan Liu","doi":"10.2320/MATERTRANS1989.41.1293","DOIUrl":null,"url":null,"abstract":"Boron carbide (B 4.3 C) semiconductors with metal incorporation were prepared by hot pressing mixtures of boron carbide powder (B 4.3 C) and 0.5 ∼ 1 at% metal (Zr or V). The influences of impurity incorporation on the subtle structure and conductivity of B 4.3 C crystals were investigated. Positron lifetime spectrum, x-ray diffraction and Doppler-broadening analyses indicate that appropriate metal introduction can modify the B 4.3 C structure. Especially, noticeable vacancies are introduced into about the B(3) sites at the chain centers. Meanwhile, the B 4.3 C lattice cell contracts a little along the c axis. No distinctive change of the electrical conductivity is found to accompany the structural change.","PeriodicalId":18264,"journal":{"name":"Materials Transactions Jim","volume":"707 1","pages":"1293-1296"},"PeriodicalIF":0.0000,"publicationDate":"2000-10-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Transactions Jim","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2320/MATERTRANS1989.41.1293","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7

Abstract

Boron carbide (B 4.3 C) semiconductors with metal incorporation were prepared by hot pressing mixtures of boron carbide powder (B 4.3 C) and 0.5 ∼ 1 at% metal (Zr or V). The influences of impurity incorporation on the subtle structure and conductivity of B 4.3 C crystals were investigated. Positron lifetime spectrum, x-ray diffraction and Doppler-broadening analyses indicate that appropriate metal introduction can modify the B 4.3 C structure. Especially, noticeable vacancies are introduced into about the B(3) sites at the chain centers. Meanwhile, the B 4.3 C lattice cell contracts a little along the c axis. No distinctive change of the electrical conductivity is found to accompany the structural change.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
含金属杂质碳化硼的正电子光谱
采用碳化硼粉末(b4.3 C)和0.5 ~ 1 at%金属(Zr或V)的热压混合制备了掺杂金属的碳化硼(b4.3 C)半导体,研究了掺杂杂质对b4.3 C晶体细微结构和电导率的影响。正电子寿命谱、x射线衍射和多普勒展宽分析表明,适当的金属引入可以改变b4.3 C的结构。特别是在链中心的B(3)位上引入了明显的空位。同时,b4.3 C晶格胞沿C轴略有收缩。没有发现电导率的明显变化伴随着结构的变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Solid state diffusion bonding of silicon nitride using vanadium foils : Structural and functional control of materials through solid-solid phase transformations in high magnetic field Characteristics of paramagnetic and diamagnetic anisotropy which induce magnetic alignment of micron-sized non-ferromagnetic particles : Structural and functional control of materials through solid-solid phase transformations in high magnetic field Combination of triboelectrostatic separation and air tabling for sorting plastics from a multi-component plastic mixture : New systems and processes in recycling and high performance waste treatments Impurity removal from carbon saturated liquid iron using lead solvent : New systems and processes in recycling and high performance waste treatments Surface treatment of magnesium alloys by artificial corrosion-oxidization method : Special issue on platform science and technology for advanced magnesium alloys, II
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1