Crystal Growth of Cr2O3 Thin Films on YAlO3(001) Substrate

Kosuke Hashimoto, Takashi Sumida, S. Fukui, T. Hirato, T. Nagata, H. Yamamoto, N. Iwata
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Abstract

The Cr 2 O 3 thin films are fabricated on YAlO 3 (YAO)(0 0 1) substrates etched with 5M and 12M NaOH solutions. After the etching with 12M NaOH solution, the YAO surface showed step-terraces structure with the step height of one unit. The surface morphology of Cr 2 O 3 thin films grown on 5M, 12M etched YAO and r -cut sapphire substrate is almost similar even though the crystal structure of YAO is orthorhombic. Focusing on one grain of Cr 2 O 3 thin film, the surface is two dimensionally flat with approximately unit step of 0.36nm. The Cr 2 O 3 films expitaxially grow with the relationship of Cr 2 O 3 ±[1 1 0] // YAO[1 0 0], Cr 2 O 3 ±[ 0], double-sign corresponds, and Cr 2 O 3 (1 2) // YAO(0 0 1).
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YAlO3(001)衬底上Cr2O3薄膜的晶体生长
用5M和12M NaOH溶液在yalo3 (YAO)(0 0 1)衬底上刻蚀制备了cr2o3薄膜。经12M NaOH溶液刻蚀后,YAO表面呈阶梯状结构,阶梯高度为1个单位。在5M、12M蚀刻的YAO和r切割的蓝宝石衬底上生长的cr2o3薄膜表面形貌几乎相似,尽管YAO的晶体结构是正交的。聚焦于一粒cr2o3薄膜,其表面为二维平面,单位步长约为0.36nm。cr2o3薄膜呈cr2o3±[1 0 0]// YAO[1 0 0]、cr2o3±[0]、双符号对应、cr2o3 (1 2) // YAO(0 0 1)向外生长。
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