Effect of Textured Glasses on Conversion Efficiency in Dye-Sensitized Solar Cells

Ryutaro Kimura, Yuji Nishiyasu, C. Oka, S. Hata, J. Sakurai
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Abstract

In this paper, three types of optical textured glass substrates were prepared at the glass/transparent conductive oxide interface using polydimethylsiloxane nanoimprint lithography to increase the conversion efficiency of dye-sensitized solar cells (DSSCs). There were three types of textures: nanotexture, microtexture, and micro/nano double texture. In terms of optical characteristics, it was confirmed that the reflectance of all of the textured glass substrates was lower than that of flat glass in the mean value of the 400–800 nm wavelength band. Further, the diffuse transmittance was higher than that of flat glass for all of the textured glass substrates, and the D-Tx was particularly high. DSSCs were fabricated using N749 and N719 dyes; their size was 6 mm2. The conversion efficiencies of the N749 DSSCs were improved by 11% for the N-Tx (η of 2.41%) and 10% for the D-Tx (η of 2.38%) compared with flat glass (η of 2.17%) DSSCs. On the other hand, the M-Tx did not improve it. The conversion efficiencies of the N719 DSSCs with textured glass substrates were improved by 7.5% for the M-Tx (η of 2.74%), 18% for the N-Tx (η of 3.01%), and 26% for the D-Tx (η of 3.22%) compared with flat glass (η of 2.55%) DSSCs.
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纹理玻璃对染料敏化太阳能电池转换效率的影响
为了提高染料敏化太阳能电池(DSSCs)的转换效率,采用聚二甲基硅氧烷纳米压印光刻技术在玻璃/透明导电氧化物界面上制备了三种光学纹理玻璃基板。纹理有三种类型:纳米纹理、微纹理和微纳双纹理。在光学特性方面,证实了在400-800 nm波段内,所有纹理玻璃基板的反射率均低于平板玻璃的反射率平均值。此外,所有纹理玻璃基板的漫射透过率均高于平板玻璃,且D-Tx特别高。采用N749和N719染料制备DSSCs;它们的大小为6平方毫米。与平板玻璃(η为2.17%)DSSCs相比,N-Tx (η为2.41%)和D-Tx (η为2.38%)的转换效率分别提高了11%和10%。另一方面,M-Tx并没有改进它。与平板玻璃(η为2.55%)相比,M-Tx (η为2.74%)、N-Tx (η为3.01%)和D-Tx (η为3.22%)的N719 DSSCs的转换效率分别提高了7.5%、18%和26%。
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来源期刊
Nanomanufacturing and Metrology
Nanomanufacturing and Metrology Materials Science-Materials Science (miscellaneous)
CiteScore
5.40
自引率
0.00%
发文量
36
期刊介绍: Nanomanufacturing and Metrology is a peer-reviewed, international and interdisciplinary research journal and is the first journal over the world that provides a principal forum for nano-manufacturing and nano-metrology.Nanomanufacturing and Metrology publishes in the forms including original articles, cutting-edge communications, timely review papers, technical reports, and case studies. Special issues devoted to developments in important topics in nano-manufacturing and metrology will be published periodically.Nanomanufacturing and Metrology publishes articles that focus on, but are not limited to, the following areas:• Nano-manufacturing and metrology• Atomic manufacturing and metrology• Micro-manufacturing and metrology• Physics, chemistry, and materials in micro-manufacturing, nano-manufacturing, and atomic manufacturing• Tools and processes for micro-manufacturing, nano-manufacturing and atomic manufacturing
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