Toshihiro Tabuchi, Y. Toyoshima, S. Fujimoto, M. Takashiri
{"title":"Application of low hydrogen-diluted and low gaseous-pressure monosilane plasma to fast deposition of solar-cell-grade microcrystalline silicon","authors":"Toshihiro Tabuchi, Y. Toyoshima, S. Fujimoto, M. Takashiri","doi":"10.14723/TMRSJ.41.385","DOIUrl":null,"url":null,"abstract":"Toshihiro Tabuchi, Yasumasa Toyoshima, Shinichi Fujimoto, and Masayuki Takashiri 1Development Division, Komatsu Ltd., 1200 Manda, Hiratsuka, Kanagawa 254-8567, Japan 2KELK Ltd., 3-25-1 Shinomiya, Hiratsuka, Kanagawa 254-8543 Japan 3Department of Materials Science, Tokai University, 4-1-1 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan * Corresponding authors: e-mail: toshihiro_tabuchi@komatsu.co.jp, and/or takashiri@tokai-u.jp","PeriodicalId":23220,"journal":{"name":"Transactions-Materials Research Society of Japan","volume":"67 1","pages":"385-392"},"PeriodicalIF":0.0000,"publicationDate":"2016-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Transactions-Materials Research Society of Japan","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.14723/TMRSJ.41.385","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Toshihiro Tabuchi, Yasumasa Toyoshima, Shinichi Fujimoto, and Masayuki Takashiri 1Development Division, Komatsu Ltd., 1200 Manda, Hiratsuka, Kanagawa 254-8567, Japan 2KELK Ltd., 3-25-1 Shinomiya, Hiratsuka, Kanagawa 254-8543 Japan 3Department of Materials Science, Tokai University, 4-1-1 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan * Corresponding authors: e-mail: toshihiro_tabuchi@komatsu.co.jp, and/or takashiri@tokai-u.jp