C. Dinh, S. Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Keisuke Yoshida, Soichiro Okada, T. Onitsuka, S. Kawakami, S. Shimura, M. Muramatsu, Kosuke Yoshihara, J. Petersen, D. D. Simone, P. Foubert, G. Vandenberghe, L. Huli, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Kanzo Kato, K. Nafus, Angélique Raley
{"title":"EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing","authors":"C. Dinh, S. Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Keisuke Yoshida, Soichiro Okada, T. Onitsuka, S. Kawakami, S. Shimura, M. Muramatsu, Kosuke Yoshihara, J. Petersen, D. D. Simone, P. Foubert, G. Vandenberghe, L. Huli, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Kanzo Kato, K. Nafus, Angélique Raley","doi":"10.2494/photopolymer.35.87","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"25 1","pages":""},"PeriodicalIF":0.4000,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Photopolymer Science and Technology","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.2494/photopolymer.35.87","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"POLYMER SCIENCE","Score":null,"Total":0}
期刊介绍：
Journal of Photopolymer Science and Technology is devoted to the publication of articles on the scientific progress and the technical development of photopolymers.
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