A MEMS Device Integrating Multiple Cantilever Displacement Sensors to Evaluate Flat Machined Surfaces

H. Shimizu, Koichi Tamiya, Shoichiro Mizukami, Yuuma Tamaru
{"title":"A MEMS Device Integrating Multiple Cantilever Displacement Sensors to Evaluate Flat Machined Surfaces","authors":"H. Shimizu, Koichi Tamiya, Shoichiro Mizukami, Yuuma Tamaru","doi":"10.20965/ijat.2022.p0582","DOIUrl":null,"url":null,"abstract":"Multi-point scanning measurement, which is effective in eliminating motion errors of the stage in on-machine profile measurement, requires multiple displacement sensors of equal pitch to measure displacements simultaneously. However, it is not easy to arrange small sensors with high alignment accuracy when applying the multi-point method at a narrow pitch. In addition, if many sensors can be arranged in parallel, improvement in measurement accuracy can be expected. Therefore, a new micro electro mechanical system (MEMS) device for straightness measurement, one that integrates 10 cantilever displacement sensors, has been proposed. This device can be expected to solve the problem involved in the multi-point method because of the characteristics of MEMS, as the semiconductor processing method can make mechanical structures with high accuracy and it can easily make the device with many identical structures. The device is designed to measure waviness less than 100 μm in height. Ten cantilevers of 11 mm length are fabricated in parallel with 1.8 mm pitch on a side of a base substrate 20 mm square. The strain induced by a displacement of the probe placed near the front edge of the cantilever is detected as a change in the resistance of the piezo resistor at the foot of the cantilever. In the fabrication process of this device, crystal anisotropic etching is performed for 12 hours to form probes 250 μm high. A new fabrication process is also proposed in which a protective process is added to prevent damage to the circuits already formed during the etching. A prototype is investigated, and it is found that the resistance value increases about 0.45% in proportion to the displacement of 100 μm. It is therefore confirmed that this device has the basic ability to detect displacement.","PeriodicalId":13583,"journal":{"name":"Int. J. Autom. Technol.","volume":"407 1","pages":"582-587"},"PeriodicalIF":0.0000,"publicationDate":"2022-09-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Int. J. Autom. Technol.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.20965/ijat.2022.p0582","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Multi-point scanning measurement, which is effective in eliminating motion errors of the stage in on-machine profile measurement, requires multiple displacement sensors of equal pitch to measure displacements simultaneously. However, it is not easy to arrange small sensors with high alignment accuracy when applying the multi-point method at a narrow pitch. In addition, if many sensors can be arranged in parallel, improvement in measurement accuracy can be expected. Therefore, a new micro electro mechanical system (MEMS) device for straightness measurement, one that integrates 10 cantilever displacement sensors, has been proposed. This device can be expected to solve the problem involved in the multi-point method because of the characteristics of MEMS, as the semiconductor processing method can make mechanical structures with high accuracy and it can easily make the device with many identical structures. The device is designed to measure waviness less than 100 μm in height. Ten cantilevers of 11 mm length are fabricated in parallel with 1.8 mm pitch on a side of a base substrate 20 mm square. The strain induced by a displacement of the probe placed near the front edge of the cantilever is detected as a change in the resistance of the piezo resistor at the foot of the cantilever. In the fabrication process of this device, crystal anisotropic etching is performed for 12 hours to form probes 250 μm high. A new fabrication process is also proposed in which a protective process is added to prevent damage to the circuits already formed during the etching. A prototype is investigated, and it is found that the resistance value increases about 0.45% in proportion to the displacement of 100 μm. It is therefore confirmed that this device has the basic ability to detect displacement.
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一种集成多悬臂位移传感器的MEMS器件用于评估平面加工表面
多点扫描测量需要多个等节距位移传感器同时测量位移,可有效消除工作台在机内轮廓测量中的运动误差。然而,在窄间距应用多点方法时,不容易布置具有高对准精度的小型传感器。此外,如果多个传感器可以并行布置,则可以预期测量精度的提高。为此,提出了一种集成了10个悬臂位移传感器的微机电系统(MEMS)直线度测量装置。由于MEMS的特性,该器件有望解决多点方法所涉及的问题,因为半导体加工方法可以制作精度高的机械结构,并且可以轻松地制作许多相同结构的器件。该装置设计用于测量高度小于100 μm的波浪度。10个11毫米长的悬臂在20毫米正方形的基板侧面以1.8毫米的间距平行制造。由放置在悬臂前缘附近的探头位移引起的应变被检测为悬臂脚的压电电阻电阻的变化。在该器件的制造过程中,晶体各向异性蚀刻12小时,形成250 μm高的探针。提出了一种新的制造工艺,其中增加了一个保护过程,以防止在蚀刻过程中已经形成的电路损坏。实验结果表明,每位移100 μm,电阻值增加约0.45%。由此证实,该装置具有基本的位移检测能力。
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