Quantifying and coping with parametric variations in 3D-stacked microarchitectures

S. Ozdemir, Yan Pan, Abhishek Das, G. Memik, G. Loh, A. Choudhary
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引用次数: 17

Abstract

Variability in device characteristics, i.e., parametric variations, is an important problem for shrinking process technologies. They manifest themselves as variations in performance, power consumption, and reduction in reliability in the manufactured chips as well as low yield levels. Their implications on performance and yield are particularly profound on 3D architectures: a defect on even a single layer can render the entire stack useless. In this paper, we show that instead of causing increased yield losses, we can actually exploit 3D technology to reduce yield losses by intelligently devising the architectures. We take advantage of the layer-to-layer variations to reduce yield losses by splitting critical components among multiple layers. Our results indicate that our proposed method achieves a 30.6% lower yield loss rate compared to the same pipeline implemented on a 2D architecture.
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三维堆叠微架构中参数变化的量化与处理
器件特性的可变性,即参数变化,是缩小工艺技术的一个重要问题。它们表现为性能、功耗和制造芯片可靠性的降低以及低产量水平的变化。它们对性能和产量的影响在3D架构中尤为深刻:即使是单层的缺陷也会使整个堆栈失效。在本文中,我们表明,我们实际上可以利用3D技术通过智能设计架构来减少良率损失,而不是造成增加的良率损失。我们利用了层与层之间的变化,通过在多层之间分割关键组件来减少良率损失。我们的研究结果表明,与在2D架构上实现的相同管道相比,我们提出的方法的产率损失率降低了30.6%。
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