Dan Bailey, E. Soenen, Puneet Gupta, P. Villarrubia, S. Dhong
{"title":"Challenges at 45nm and beyond","authors":"Dan Bailey, E. Soenen, Puneet Gupta, P. Villarrubia, S. Dhong","doi":"10.1109/ICCAD.2008.4681538","DOIUrl":null,"url":null,"abstract":"Design at 45nm technologies and below is a risky proposition because of the many design challenges involved: variability, leakage, verification complexity, poor analog device performance, etc. In this panel, experienced designers coming from different backgrounds talk about how they have overcome some of the design and CAD challenges in 45nm, what CAD challenges still exist and how the CAD community can help.","PeriodicalId":90518,"journal":{"name":"ICCAD. IEEE/ACM International Conference on Computer-Aided Design","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2008-11-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ICCAD. IEEE/ACM International Conference on Computer-Aided Design","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICCAD.2008.4681538","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Design at 45nm technologies and below is a risky proposition because of the many design challenges involved: variability, leakage, verification complexity, poor analog device performance, etc. In this panel, experienced designers coming from different backgrounds talk about how they have overcome some of the design and CAD challenges in 45nm, what CAD challenges still exist and how the CAD community can help.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
