Thin-film edge-aligned junctions for small-area surface studies

Abstract

A straightforward technique is described whereby the edges of two contiguous films can be precisely aligned without overlap so that the contact area between them is defined by the thickness times the width of the film. In this way junction areas as small as 0.02 μm² can be achieved with very simple photolithographic techniques. Electron micrographic, electrical and surface studies have been carried out on junctions of this type and preliminary results are reported.