Heat and Mass Transfer of Impinging Jet Flow with Shower Head Flow on a Heated Disc in a Cylindrical Flow Channel

IF 0.2 Q4 ENERGY & FUELS Journal of The Japan Institute of Energy Pub Date : 2021-12-20 DOI:10.3775/jie.100.273
Fumika Satō, Satoki Ishida, Yuuhei Kawasaki, Misaki Honda, K. Tanoue
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Abstract

The horizontal temperature measurement on the heated disc in the cylindrical hydrogen flow channel with impinging jet was performed to examine the effect of the non-dimensional distance between the gas inlet and the heated disc (HN*) and the nozzle Reynolds number (ReN) on the heat transfer in a chemical vapor deposition (CVD) reactor. Furthermore, two dimensional numerical simulation in heat and mass transfer on the heated disc was conducted to predict the growth rate distribution along the r-coordinate in the CVD reactor. The less HN* created, the lower the experimental temperature at r* = 0 mm because of the impinging jet flow. The calculation temperature along the r-coordinate agreed well with the experimental temperature except for HN* = 0.69 at r* = 0. When the non-dimensional surface reaction rate constant k* was 3.60×10-9 ≦ k*≦ 1.27×10-7 (k = 10-6 m/s), the predicted growth rate of the source material on the heated disc decreased exponentially with the r-direction because the film formation could proceed under the diffusion rate-determining condition along the radial direction. On the other hand, at the central region the influence of mass transfer due to forced convection discharged from the jet becomes stronger at 0.036 ≦ k*≦ 0.126 (k = 1 m/s) than that at 3.60×10-9 ≦ k* ≦ 1.27×10-7 (k = 10-6 m/s) and the film formation rate is greatly attenuated. The higher the distance from the nozzle to the heated disc HN got, the smaller the gradient of the growth rate in the r-direction at 0 ≦ r* ≦ 3.45 because the mass transfer could be controlled by the surface reaction if the HN* increased. The more the HN* and the less the reaction rate were constant, the smaller the coefficient of variation of the growth rate. In this study, the minimum coefficient of variation for the growth rate distribution was about 0.41. Therefore, it is suggested that the hybrid supply system of the raw material for chemical vapor deposition from not only impinging jet flow but also shower head flow could be suitable.
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圆柱流道内带淋浴头流的冲击射流传热传质研究
为了研究气相沉积(CVD)反应器中进气口与被加热盘之间的无因次距离(HN*)和喷嘴雷诺数(ReN)对传热的影响,对具有撞击射流的圆柱形氢气流道内被加热盘的水平温度进行了测量。在此基础上,利用二维数值模拟方法,对CVD反应器内的传热传质过程进行了预测。在r* = 0 mm处,由于撞击射流的作用,产生的HN*越少,实验温度越低。除r* = 0时HN* = 0.69外,沿r坐标方向的计算温度与实验温度基本一致。当无量纲表面反应速率常数k*为3.60×10-9≦k*≦1.27×10-7 (k = 10-6 m/s)时,源物质在加热盘上的预测生长速率沿r方向呈指数递减,这是因为膜的形成可以在决定扩散速率的条件下沿径向进行。另一方面,在中心区域,射流强制对流对传质的影响在0.036≦k*≦0.126 (k = 1 m/s)时强于在3.60×10-9≦k*≦1.27×10-7 (k = 10-6 m/s)时,成膜速率大大减弱。随着喷嘴到被加热圆盘HN的距离越远,在0≦r*≦3.45处,r方向的生长速率梯度越小,这是由于HN*增大时传质可以由表面反应控制。HN*越多,反应速率越小,生长速率的变异系数越小。在本研究中,生长速率分布的最小变异系数约为0.41。因此,建议采用冲击射流和淋头射流混合供给化学气相沉积原料的混合供给系统。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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