Ka-band 2.3W power AlGaN/GaN heterojunction FET

K. Kasahara, H. Miyamoto, Y. Ando, Y. Okamoto, T. Nakayama, M. Kuzuhara
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引用次数: 35

Abstract

Describes the first successful watt-level Ka-band power operation of an AlGaN/GaN heterojunction FET fabricated on a SiC substrate. Taking the advantage of high breakdown voltage, high-current, and high-gain characteristics of the short-channel GaN-based FET, state-of-the-art high-power performance of >2W has been achieved at 30GHz from a single chip having a gate width of 0.36mm. The developed device with a gate length of 0.25/spl mu/m exhibited a linear gain of 8.8dB at 30GHz, indicating that the short-channel AlGaN/GaN FET is promising for a variety of high-power applications at Ka-band and above.
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描述了在SiC衬底上制造的AlGaN/GaN异质结FET的第一个成功的瓦级ka波段功率操作。利用短通道氮化镓FET的高击穿电压、大电流和高增益特性,在30GHz下,单芯片栅极宽度为0.36mm,实现了>2W的高功率性能。所开发的器件栅极长度为0.25/spl mu/m,在30GHz时线性增益为8.8dB,表明短通道AlGaN/GaN场效应管在ka波段及以上的各种高功率应用中具有广阔的前景。
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