Sampling Points Selection Algorithm For Advanced Photolithography Process

Abstract

Photolithography process is one of the most critical in the semiconductor industry since it drives the Moore’s law and the advances in microelectronics in general. Hard constraints on precision, throughput and image quality require software control algorithms and high precision measurements. In such strict environment and requirements, where quality and performance goals need to be met, the optimal design of the measurements is more than necessary. In this paper we propose an Optimal Design of Experiments Algorithm that will enable the process to be able to obtain G-optimal result in a highly competitive time fraction that will ensure at the same time the throughput optimality of the photolithography machines.