Defect and variation tolerance logic mapping for crossbar nanoarchitectures as a multi-objective problem

Yi Yang, Bo Yuan, Bin Li
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引用次数: 4

Abstract

In addition to high defect density, serious variations exist in self-assembled nanoelectronic crossbar architectures compared to the conventional lithography-based CMOS integrated circuits. Therefore, it is one of the emerging challenges to tolerate variations apart from tolerating defects. In addition, considering many-sided factors simultaneously in variation tolerance is necessary. In this paper, we first consider two important factors in variation tolerance simultaneously and formulate this problem as a multi-objective optimization problem, then employ and extend an effective multi-objective evolutionary algorithm called nondominated sorting genetic algorithm II (NSGA-II) to the variation tolerance. Experimental results show the effectiveness of the proposed approach.
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作为多目标问题的横杆纳米结构的缺陷和变异容限逻辑映射
除了高缺陷密度外,自组装纳米电子横条架构与传统的基于光刻的CMOS集成电路相比存在严重的变化。因此,除了容忍缺陷之外,容忍变化是新出现的挑战之一。此外,在偏差容限中需要同时考虑多方面因素。本文首先同时考虑影响变异容忍度的两个重要因素,并将该问题化为多目标优化问题,然后将一种有效的多目标进化算法——非支配排序遗传算法II (NSGA-II)应用并推广到变异容忍度问题。实验结果表明了该方法的有效性。
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