{"title":"Integration of Sr0.8Bi2.2Ta2O9/HfO2 ferroelectric/dielectric composite film on Si substrate for nonvolatile memory applications","authors":"R. K. Jha, P. Singh, M. Goswami, B. R. Singh","doi":"10.1080/07315171.2019.1668682","DOIUrl":null,"url":null,"abstract":"Abstract Sr0.8Bi2.2Ta2O9 (SBT) ferroelectric and HfO2 dielectric layers were successively deposited onto the p-type (100) Si substrate via RF sputtering. Metal-Ferroelectric-Insulator-Silicon (MFIS) capacitors were fabricated with 200 nm SBT and 10 nm HfO2 film shows the improved memory window of 1.811 V as compared to the 1.27 V in Metal-Ferroelectric-Silicon (MFS) structures. Improvement in leakage current and breakdown voltage was also observed in the MFIS structures as compared to the MFS structures. Degradation of ferroelectric polarization was not pronounced even after applying 8 × 1012 bipolar cycles in MF(200nm)I(10nm)S structures and the device shows significant data retention time of more than 2.5 hours.","PeriodicalId":50451,"journal":{"name":"Ferroelectrics Letters Section","volume":"1 1","pages":"82 - 89"},"PeriodicalIF":1.3000,"publicationDate":"2019-12-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ferroelectrics Letters Section","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1080/07315171.2019.1668682","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
引用次数: 3
Abstract
Abstract Sr0.8Bi2.2Ta2O9 (SBT) ferroelectric and HfO2 dielectric layers were successively deposited onto the p-type (100) Si substrate via RF sputtering. Metal-Ferroelectric-Insulator-Silicon (MFIS) capacitors were fabricated with 200 nm SBT and 10 nm HfO2 film shows the improved memory window of 1.811 V as compared to the 1.27 V in Metal-Ferroelectric-Silicon (MFS) structures. Improvement in leakage current and breakdown voltage was also observed in the MFIS structures as compared to the MFS structures. Degradation of ferroelectric polarization was not pronounced even after applying 8 × 1012 bipolar cycles in MF(200nm)I(10nm)S structures and the device shows significant data retention time of more than 2.5 hours.
期刊介绍：
Ferroelectrics Letters is a separately published section of the international journal Ferroelectrics. Both sections publish theoretical, experimental and applied papers on ferroelectrics and related materials, including ferroelastics, ferroelectric ferromagnetics, electrooptics, piezoelectrics, pyroelectrics, nonlinear dielectrics, polymers and liquid crystals.
Ferroelectrics Letters permits the rapid publication of important, quality, short original papers on the theory, synthesis, properties and applications of ferroelectrics and related materials.
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