Dielectric PMMA Thin Layers Obtained by Spin Coating for Electronic Applications

E. Herbei
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Abstract

Thin polymeric films with dielectric properties become a very important part of today’s devices, being indispensable in industry, electrical applications and not only. Nowadays polymeric materials have attracted attention in academic and industrial research due to the miniaturization at the micro and nanoscale of different electronic devices. Polymers in general are used for their light weight, good mechanical strength, dielectric properties, and optical properties, which make them multifunctional materials.This paper presents research on polymethyl methacrylate (PMMA) thin films obtained by the sol-gel method. The optimization of thin film PMMA layers has been a problem due to the importance of using the polymer in the different electronic domains. Thin films of PMMA with different thicknesses were deposited onto glass and silicon wafers in order to measure dielectric properties. For dielectric properties, the PMMA thin layer was inserted in a metal-insulator-metal structure (MIM). In order to observe the morphology and roughness of thin film, optical microscopy, scanning electron microscopy and atomic force microscopy have proceeded.The dielectric constant (k) was calculated using the electrical capacitance formula. The I-V and C-V curves showed a dielectric behavior with a leakage current between 10-11 and 10-8 A and a constant capacitance in the bias range ± 5 V.
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电子用自旋镀膜获得介电PMMA薄层
具有介电性能的聚合物薄膜已成为当今器件的重要组成部分,在工业、电气应用等领域都是不可缺少的。目前,高分子材料由于其在微纳米尺度上的微型化而引起了学术界和工业界的广泛关注。聚合物通常因其重量轻、机械强度好、介电性能好、光学性能好而被使用,这使它们成为多功能材料。本文对溶胶-凝胶法制备聚甲基丙烯酸甲酯(PMMA)薄膜进行了研究。由于在不同的电子领域中使用聚合物的重要性,薄膜PMMA层的优化一直是一个问题。在玻璃片和硅片上沉积不同厚度的PMMA薄膜,测量其介电性能。为了提高介质性能,将PMMA薄层插入金属-绝缘体-金属结构(MIM)中。为了观察薄膜的形貌和粗糙度,进行了光学显微镜、扫描电子显微镜和原子力显微镜。采用电容公式计算介电常数k。I-V和C-V曲线表现出介电特性,漏电流在10-11和10-8 a之间,电容在±5 V偏置范围内恒定。
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审稿时长
8 weeks
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