Status of repetitive pulsed power at Sandia National Laboratories

L. Schneider, K. Reed, H. Harjes, G. Pena, L. Martinez, M. Harden
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引用次数: 8

Abstract

Multi-kilojoule repetitive pulsed power technology moved from a laboratory environment into its first commercial application in 1997 as a driver for ion beam surface treatment. Sandia's RHEPP II (Repetitive High energy Pulsed Power), a repetitive 2.5 kJ/pulse electron beam accelerator, has supported the development of radiation treatment processes for polymers and elastomers, food products, and high dose-rate effects testing for defense programs since early 1996. Dos Lineas, an all solid-state testbed, has demonstrated synchronization techniques for parallel magnetic modulator systems and is continuing the development of design standards for long lifetime magnetic switches and voltage adders at a shot rate capability that exceeds 5/spl times/10/sup 6/ pulses per day. This paper describes progress in multi-kilojoule class repetitive pulsed power technology development, magnetic switching technology for modulator applications, and future research and development directions.
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桑迪亚国家实验室重复脉冲功率的现状
1997年,作为离子束表面处理的驱动因素,多千焦耳重复脉冲功率技术从实验室环境进入了首次商业应用。桑迪亚的RHEPP II(重复高能脉冲功率)是一种重复的2.5 kJ/脉冲电子束加速器,自1996年初以来一直支持聚合物和弹性体、食品的辐射处理工艺的发展,以及国防项目的高剂量率效应测试。Dos Lineas是一个全固态测试平台,已经展示了并行磁调制器系统的同步技术,并正在继续开发长寿命磁开关和电压加法器的设计标准,其射速能力超过每天5/spl次/10/sup / 6/脉冲。本文介绍了多千焦耳级重复脉冲功率技术的发展进展、调制器应用磁开关技术以及未来的研究和发展方向。
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