Development of a Sharp-Tipped L-Shaped Stylus for Measurement of Nanoscale Sidewall Features

Kosuke Uchiyama, H. Murakami, A. Katsuki, T. Sajima
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Abstract

This paper presents a system for measuring nanoscale sidewall features using an L-shaped stylus with a sharp tip. By sharpening the tip of the stylus to the nanometer scale, it is possible to measure nanoscale sidewall features. The stylus shaft is deflected when the sharpened stylus tip contacts the measured surface, and this deflection is measured optically. In this study, we develop the fabrication method of an L-shaped sharpened stylus 20 μm in diameter and 4 mm in length by etching, CO2 laser processing, and bonding. Then, the measurement accuracy and repeatability are examined by measuring V-grooves with nanoscale features. The results clarify that the pitch is approximately 0.3 μm, which is almost the same as the value measured using the photographic image, but the depths measured by the styli fabricated by CO2 laser processing and bonding are approximately 0.15 and 0.07 μm, respectively. The depth measured by the stylus fabricated by bonding is smaller than that measured from the image (approximately 0.16 μm), presumably because of the morphological filter. The maximum repeatability errors for 10 measurements using the styli fabricated by CO2 laser processing and bonding are within ±0.056 and ±0.022 μm in scanning mode, respectively. It is also confirmed that the stylus tip exhibits minimal wear even after 500 measurements.
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一种用于测量纳米尺度侧壁特征的尖端l形触头的研制
本文提出了一种利用尖端为l形的触控笔测量纳米级侧壁特征的系统。通过将笔尖锐化到纳米尺度,可以测量纳米尺度的侧壁特征。当锐化的触控笔尖端接触被测表面时,触控笔轴发生偏转,这种偏转是光学测量的。本研究采用蚀刻、CO2激光加工和键合的方法制备了直径为20 μm、长度为4 mm的l形尖笔。然后,通过测量具有纳米尺度特征的v型沟槽,验证了测量精度和重复性。实验结果表明,柱间距约为0.3 μm,与照相测量值基本一致,而CO2激光加工和键合的柱深度分别约为0.15 μm和0.07 μm。通过键合制作的触针测量的深度比从图像测量的深度小(约0.16 μm),可能是由于形态滤波器的原因。在扫描模式下,采用CO2激光加工和键合制作的测针10次测量的最大重复性误差分别在±0.056和±0.022 μm以内。这也证实,即使在500次测量后,手写笔尖端也显示出最小的磨损。
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