Effect of Thermal Annealing in Ammonia on the Properties of InGaN Nanowires with Different Indium Concentrations

C. Hahn, A. Cordones, Sean Andrews, Hanwei Gao, Anthony Fu, S. Leone, Peidong Yang
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引用次数: 9

Abstract

The utility of an annealing procedure in ammonia ambient is investigated for improving the optical characteristics of InxGa1–xN nanowires (0.07 ≤ x ≤ 0.42) grown on c-Al2O3 using a halide chemical vapor deposition method. Morphological studies using scanning electron microscopy confirm that the nanowire morphology is retained after annealing in ammonia at temperatures up to 800 °C. However, significant indium etching and composition inhomogeneities are observed for higher indium composition nanowires (x = 0.28, 0.42), as measured by energy-dispersive X-ray spectroscopy and Z-contrast scanning transmission electron microscopy. Structural analyses, using X-ray diffraction and high-resolution transmission electron microscopy, indicate that this is a result of the greater thermal instability of higher indium composition nanowires. The effect of these structural changes on the optical quality of InGaN nanowires is examined using steady-state and time-resolved photoluminescence measurements. Annealing in ammoni...
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氨热退火对不同铟浓度InGaN纳米线性能的影响
利用卤化物化学气相沉积法,研究了氨环境下退火工艺对在c-Al2O3上生长的InxGa1-xN纳米线(0.07≤x≤0.42)光学特性的改善作用。形态学研究使用扫描电子显微镜证实,纳米线形态后,在氨退火温度高达800°C后保留。然而,通过能量色散x射线光谱和z -对比扫描透射电子显微镜测量,在高铟成分纳米线(x = 0.28, 0.42)中观察到明显的铟蚀刻和成分不均匀性。利用x射线衍射和高分辨率透射电子显微镜进行的结构分析表明,这是由于铟含量高的纳米线具有更大的热不稳定性。这些结构变化对InGaN纳米线光学质量的影响通过稳态和时间分辨光致发光测量来检测。氨水退火…
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