Chemical Synthesis and Characterization of Nickel Sulphide Thin Film Electrode for Supercapacitor Performances

M. Sonawane, R. Patil
{"title":"Chemical Synthesis and Characterization of Nickel Sulphide Thin Film Electrode for Supercapacitor Performances","authors":"M. Sonawane, R. Patil","doi":"10.26438/ijsrpas/v7i1.4245","DOIUrl":null,"url":null,"abstract":"All Nickel Sulphide thin films were deposited onto the stainless steel substrate by modified chemical bath deposition method. The structural, surface morphology were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) respectively. The electrochemical capacitor performances were examined by using cyclic voltammetry and galvanostatic charge-discharge method. The NiS electrode exhibits a good cycling performance. The specific capacitance of 353 Fgm -1 has been obtained in 2 M KOH solution at a scan rate 50 mVs -1 within the potential range 0 to 0.8 V Vs Ag/AgCl. In charge-discharge behaviors, the maximum energy density (E) of 11.7 Whkg -1 and power density (P) of 4.3 kWkg -1 was obtained at a current density 1 mA/cm 2 . Impedance spectroscopic analysis revealed that the ESR is 5 Ω in KOH electrolyte. Keywords— Nickel Sulphide (NiS), Thin films, Cyclic voltammetry, Supercapacitor, Charge-discharge","PeriodicalId":14348,"journal":{"name":"International Journal of Scientific Research in Physics and Applied Sciences","volume":"23 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2019-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Scientific Research in Physics and Applied Sciences","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.26438/ijsrpas/v7i1.4245","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

All Nickel Sulphide thin films were deposited onto the stainless steel substrate by modified chemical bath deposition method. The structural, surface morphology were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) respectively. The electrochemical capacitor performances were examined by using cyclic voltammetry and galvanostatic charge-discharge method. The NiS electrode exhibits a good cycling performance. The specific capacitance of 353 Fgm -1 has been obtained in 2 M KOH solution at a scan rate 50 mVs -1 within the potential range 0 to 0.8 V Vs Ag/AgCl. In charge-discharge behaviors, the maximum energy density (E) of 11.7 Whkg -1 and power density (P) of 4.3 kWkg -1 was obtained at a current density 1 mA/cm 2 . Impedance spectroscopic analysis revealed that the ESR is 5 Ω in KOH electrolyte. Keywords— Nickel Sulphide (NiS), Thin films, Cyclic voltammetry, Supercapacitor, Charge-discharge
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
用于超级电容器性能的硫化镍薄膜电极的化学合成与表征
采用改进的化学浴沉积法将所有的硫化镍薄膜沉积在不锈钢基体上。采用x射线衍射仪(XRD)和扫描电镜(SEM)对其结构和表面形貌进行了表征。采用循环伏安法和恒流充放电法对电化学电容器的性能进行了检测。NiS电极具有良好的循环性能。在2 M KOH溶液中,在0 ~ 0.8 V Vs Ag/AgCl电位范围内,扫描速率为50 mv -1,获得了353 Fgm -1的比电容。在充放电行为中,在电流密度为1 mA/ cm2时,获得了最大能量密度(E)为11.7 Whkg -1,功率密度(P)为4.3 kWkg -1。阻抗谱分析表明,KOH电解质的ESR为5 Ω。关键词:硫化镍,薄膜,循环伏安法,超级电容器,充放电
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Possible Relations between Fast Radio Bursts and Gamma Ray Bursts Semiannual Variation of Total Ion Density of Topside Ionosphere Over Indian Equatorial and Low Latitudes An Equation for Generalized Variable Mass Systems and Its Consequences Growth, thermal, dielectric, linear and nonlinear optical studies of a novel organic single crystal 2-Amino-5-Chloropyridinium 4-hydroxybenzoate for photonics and nonlinear optical devices On Spin Atomic Model
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1