A. Enesca, A. Duţă, M. Nanu, C. Enache, R. van der Krol, J. Schoonman
{"title":"Photoelectrode materials of tungsten oxide (WO/sub 3/) for water splitting","authors":"A. Enesca, A. Duţă, M. Nanu, C. Enache, R. van der Krol, J. Schoonman","doi":"10.1109/SMICND.2005.1558782","DOIUrl":null,"url":null,"abstract":"The aim of this paper is to investigate the stability of the tungsten trioxide thin films in different conditions. Tungsten oxide (WO 3) films are prepared by means of the spray pyrolysis deposition (SPD) method using W(OC2H5)2 ethanol. The films were investigated from the morphologic (SEM), crystalline (XRD) and conductive point of view. The resulting films are conductive, crystalline and with a good conductivity in acid electrolyte. The photoelectrolysis seems to be the most efficient and non-polluting method that can be used for wafer splitting using like energy the sunlight radiation","PeriodicalId":40779,"journal":{"name":"Teatro e Storia","volume":null,"pages":null},"PeriodicalIF":0.1000,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Teatro e Storia","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMICND.2005.1558782","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"0","JCRName":"THEATER","Score":null,"Total":0}
引用次数: 1
Abstract
The aim of this paper is to investigate the stability of the tungsten trioxide thin films in different conditions. Tungsten oxide (WO 3) films are prepared by means of the spray pyrolysis deposition (SPD) method using W(OC2H5)2 ethanol. The films were investigated from the morphologic (SEM), crystalline (XRD) and conductive point of view. The resulting films are conductive, crystalline and with a good conductivity in acid electrolyte. The photoelectrolysis seems to be the most efficient and non-polluting method that can be used for wafer splitting using like energy the sunlight radiation
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