The degradation efficiency and mechanism of meclofenamic acid in aqueous solution by UV irradiation

Jian Li, Huihui Zhou, Rong-Yuh Chen, Tingchao Yu, Miaomiao Ye
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引用次数: 2

Abstract

Abstract: The photodegradation of meclofenamic acid (MCFA) was investigated using UV irradiation process. Parameters affecting the photodegradation process such as dissolved oxygen, reaction temperature, solution pH, initial MCFA concentration, humic acid, cations and anions were carried out. The intermediate products were identified by HPLC-MS analysis, and a tentative photodegradation pathway of MCFA was proposed. Results show that the photodegradation of MCFA can be modeled by the first-order kinetics. The photodegradation efficiency increases with the decreased concentration of humic acid or the decreased initial MCFA concentration, while the reaction temperature and the inorganic ions have no significant effect on the MCFA removal. It has found that the optimal initial solution pH for MCFA degradation is about 7.0. Finally, the HPLC-MS results reveal that the Cl atom in the MCFA molecule would form Cl–, followed by dechlorination, hydroxylation and cyclization of pentacyclic compounds.
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紫外辐照降解水溶液中甲氯芬酸的效果及机理研究
摘要/ Abstract摘要:采用紫外辐照法研究了甲氯芬酸(MCFA)的光降解。考察了溶解氧、反应温度、溶液pH、MCFA初始浓度、腐植酸、阳离子和阴离子等对光降解过程的影响。通过高效液相色谱-质谱分析鉴定了中间产物,提出了MCFA的初步光降解途径。结果表明,MCFA的光降解可以用一级动力学模型来模拟。随着腐植酸浓度的降低或初始MCFA浓度的降低,光降解效率提高,而反应温度和无机离子对MCFA去除率无显著影响。研究发现,MCFA降解的最佳初始溶液pH约为7.0。最后,HPLC-MS结果表明,MCFA分子中的Cl原子形成Cl -,然后是五环化合物的脱氯、羟基化和环化。
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CiteScore
0.88
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审稿时长
1 months
期刊介绍: The Journal of advanced oxidation technologies (AOTs) has been providing an international forum that accepts papers describing basic research and practical applications of these technologies. The Journal has been publishing articles in the form of critical reviews and research papers focused on the science and engineering of AOTs for water, air and soil treatment. Due to the enormous progress in the applications of various chemical and bio-oxidation and reduction processes, the scope of the Journal is now expanded to include submission in these areas so that high quality submission from industry would also be considered for publication. Specifically, the Journal is soliciting submission in the following areas (alphabetical order): -Advanced Oxidation Nanotechnologies -Bio-Oxidation and Reduction Processes -Catalytic Oxidation -Chemical Oxidation and Reduction Processes -Electrochemical Oxidation -Electrohydraulic Discharge, Cavitation & Sonolysis -Electron Beam & Gamma Irradiation -New Photocatalytic Materials and processes -Non-Thermal Plasma -Ozone-based AOTs -Photochemical Degradation Processes -Sub- and Supercritical Water Oxidation -TiO2 Photocatalytic Redox Processes -UV- and Solar Light-based AOTs -Water-Energy (and Food) Nexus of AOTs
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