Ultra – low friction characteristic of titanium diboride (TiB2) thin films at elevated temperature due to excess addition of boron

Wataru Yamato, M. Kohzaki
{"title":"Ultra – low friction characteristic of titanium diboride (TiB2) thin films at elevated temperature due to excess addition of boron","authors":"Wataru Yamato, M. Kohzaki","doi":"10.2978/jsas.33103","DOIUrl":null,"url":null,"abstract":"The research goal is to develop a new coating thin film for machining tools. The difficult-to-cut materials have an excellent characteristic and are highly demanded by industry, however there are serious issue on environment load owing to their low processing efficiency. TiB 2 thin film has a potential to decrease friction coefficient at elevated temperature, and we aimed to study decrease of friction coefficient under 0.1 at 600°C. In the previous research, it was found that the friction coefficient of TiB 2 -MoS 2 composite thin film showed 0.01 at 200°C. It is considered that this ultra-low-friction characteristic is caused by tribo-chemical reaction relating with boron. This low friction property was kept even after heat treatment at 400°C. However, the friction coefficient was increased at 500°C , and the boron and sulfur contents at the TiB 2 -MoS 2 composite thin film decreased. A new TiB 2 -MoS 2 composite film enhances boron reaction due to excess addition of boron. As a result, it was found that boron was indispensable for the ultra-low-friction characteristic at elevated temperature because it is maintained after the heat treatment at 500°C. Dry","PeriodicalId":14991,"journal":{"name":"Journal of Advanced Science","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2021-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Advanced Science","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2978/jsas.33103","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

The research goal is to develop a new coating thin film for machining tools. The difficult-to-cut materials have an excellent characteristic and are highly demanded by industry, however there are serious issue on environment load owing to their low processing efficiency. TiB 2 thin film has a potential to decrease friction coefficient at elevated temperature, and we aimed to study decrease of friction coefficient under 0.1 at 600°C. In the previous research, it was found that the friction coefficient of TiB 2 -MoS 2 composite thin film showed 0.01 at 200°C. It is considered that this ultra-low-friction characteristic is caused by tribo-chemical reaction relating with boron. This low friction property was kept even after heat treatment at 400°C. However, the friction coefficient was increased at 500°C , and the boron and sulfur contents at the TiB 2 -MoS 2 composite thin film decreased. A new TiB 2 -MoS 2 composite film enhances boron reaction due to excess addition of boron. As a result, it was found that boron was indispensable for the ultra-low-friction characteristic at elevated temperature because it is maintained after the heat treatment at 500°C. Dry
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过量添加硼对二硼化钛(TiB2)薄膜高温下超低摩擦特性的影响
研究目标是开发一种新型刀具涂层薄膜。难切削材料具有优良的特性,在工业上需求量很大,但加工效率低,环境负荷问题严重。tib2薄膜在高温下具有降低摩擦系数的潜力,我们的目标是研究在600℃下摩擦系数降低到0.1以下。在之前的研究中发现,tib2 -MoS 2复合薄膜在200℃时的摩擦系数为0.01。认为这种超低摩擦特性是由硼的摩擦化学反应引起的。即使在400°C热处理后,这种低摩擦性能仍保持不变。而在500℃时,摩擦系数增大,tib2 - mo2复合薄膜的硼和硫含量降低。一种新型tib2 - mo2复合膜由于硼的过量加入而促进了硼的反应。结果发现,硼在500℃热处理后仍能保持高温下的超低摩擦特性,是高温下超低摩擦特性不可缺少的元素。干
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