The process of molecular plating and the characteristics of the produced thin films – What we have learned in 60 years and what is still unknown

E. Artes, C. Düllmann, Carl-Christian Meyer, D. Renisch
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引用次数: 2

Abstract

Molecular plating is a well-established and widely used method for producing thin films of various elements, which are used in variety of nuclear physics applications. Sixty years have passed since the method was established, and some insights into the chemical process underlying the method and the composition of the thin films have been gained. A brief overview of what has been learned about molecular plating since its introduction and the methods applied in the characterization of molecular plated thin films is given here. Through various spectroscopic and microscopic methods, the process of molecular plating and the chemical composition are gradually being elucidated, albeit we still do not understand all aspects.
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分子电镀的工艺和薄膜的特性——60年来我们学到了什么,还有什么是未知的
分子电镀是一种成熟而广泛使用的制备各种元素薄膜的方法,用于各种核物理应用。自该方法建立以来,已经过去了60年,人们对该方法的化学过程和薄膜的组成有了一些了解。本文简要介绍了分子镀技术自问世以来所取得的进展,以及分子镀薄膜的表征方法。通过各种光谱学和显微学的方法,分子电镀的过程和化学成分正在逐渐被阐明,尽管我们仍然不了解所有的方面。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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