MOS technology development on 150 mm Ge wafers

R. Ahrenkiel, S. Holland
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Abstract

High purity crystalline germanium has several applications in optoelectronic devices. These include as a substrate and active component of tandem, high efficiency solar cells used in concentrator and space photovoltaics. Here, we are looking at the development of a Ge-based charge coupled devices (CCD) to be used in conjunction with large, terrestrial telescopes used for astronomical studies of red shifts in galaxies and other celestial bodies. In one photovoltaic phtotvoltaic application, large bulk recombination lifetimes are significant for efficiency improvement when a p-n junction is incorporated into the substrate of a tandem device. In the CCD device, the bulk lifetime is critical for low dark current. Also, the development of an insulating gate technology, with low interface recombination velocity, is a critical component of CCD development. Here we used transient photoconductive decay as a metric to evaluate the performance of such interfaces. Bulk lifetimes exceeding 2 ms were found in some high purity materials. The effects on the lifetimes after annealing of the Ge at 300C and 600C was studied. The results of various processing experiments and protocols will be reviewed.
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150mm锗晶圆上MOS技术的发展
高纯度结晶锗在光电器件中有多种应用。这些包括作为衬底和串联的有效组件,用于聚光器和空间光伏的高效太阳能电池。在这里,我们正在研究一种基于锗的电荷耦合器件(CCD)的发展,它将与大型地面望远镜结合使用,用于星系和其他天体的红移天文研究。在一个光伏光伏应用中,当将p-n结集成到串联器件的衬底中时,大量复合寿命对于效率的提高具有重要意义。在CCD器件中,体积寿命对低暗电流至关重要。此外,开发具有低界面复合速度的绝缘栅极技术是CCD发展的关键组成部分。在这里,我们使用瞬态光导衰减作为度量来评估这种界面的性能。在一些高纯度的材料中发现体积寿命超过2毫秒。研究了Ge在300℃和600℃退火对其寿命的影响。我们将回顾各种处理实验和方案的结果。
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