Electrical Characterization of TiO2 based OMEGA FinFET Compared with Conventional SiO2 Material

K. J. Swabhijit, J. Mohana
{"title":"Electrical Characterization of TiO2 based OMEGA FinFET Compared with Conventional SiO2 Material","authors":"K. J. Swabhijit, J. Mohana","doi":"10.47059/alinteri/v36i1/ajas21073","DOIUrl":null,"url":null,"abstract":"Aim: The aim of the study is to perform the electrical characterization of Innovative TiO2 based Omega FinFET and compare it with SiO2 material by varying the oxide thickness ranging from 1nm to 20nm using nanotechnology. Materials and Methods: DFT tool is used to perform the above characterisation. The method was performed for 20 samples per group, TiO2(n=20) and SiO2(n=20). Same samples were used for both the control group and experimental group. Different values of drain current were obtained by varying the thickness for both TiO2 and SiO2. Result: Drain current was obtained for TiO2 (0.645μA) and found better compared with SiO2 (0.58μA). Conclusion: It is concluded that the TiO2 Omega FinFET appears to be better compared to SiO2 based omega FinFET.","PeriodicalId":42396,"journal":{"name":"Alinteri Journal of Agriculture Sciences","volume":"116 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2021-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Alinteri Journal of Agriculture Sciences","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.47059/alinteri/v36i1/ajas21073","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Aim: The aim of the study is to perform the electrical characterization of Innovative TiO2 based Omega FinFET and compare it with SiO2 material by varying the oxide thickness ranging from 1nm to 20nm using nanotechnology. Materials and Methods: DFT tool is used to perform the above characterisation. The method was performed for 20 samples per group, TiO2(n=20) and SiO2(n=20). Same samples were used for both the control group and experimental group. Different values of drain current were obtained by varying the thickness for both TiO2 and SiO2. Result: Drain current was obtained for TiO2 (0.645μA) and found better compared with SiO2 (0.58μA). Conclusion: It is concluded that the TiO2 Omega FinFET appears to be better compared to SiO2 based omega FinFET.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
TiO2基OMEGA FinFET与传统SiO2材料的电学特性比较
目的:本研究的目的是执行创新的TiO2基Omega FinFET的电学特性,并通过使用纳米技术改变氧化物厚度从1nm到20nm,将其与SiO2材料进行比较。材料和方法:DFT工具用于执行上述表征。每组20个样品,TiO2(n=20)和SiO2(n=20)。对照组和实验组采用相同的样品。通过改变TiO2和SiO2的厚度,可以得到不同的漏极电流值。结果:TiO2 (0.645μA)的漏极电流优于SiO2 (0.58μA)。结论:与SiO2基的Omega FinFET相比,TiO2的Omega FinFET表现得更好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Alinteri Journal of Agriculture Sciences
Alinteri Journal of Agriculture Sciences AGRICULTURE, MULTIDISCIPLINARY-
自引率
0.00%
发文量
6
期刊最新文献
Efficacy of Senna Leaves Extract and Rosuvastatin on Blood Parameters of Inducing Hyperlipidemia Laboratory Rats The Response of Growth and Yield of Sweet Pepper (Capsicum Annuum) to the Spraying with Nano-amino Acids and Potassium Silicate Effect of Organic Fertilization with Humic Acid and Foliar Spraying with Bread Yeast Extract on the Growth and Yield of the Solanum Melongena L The Effect of different Types of Organic Fertilizers on the Growth and Yield of Vegetable Plants Risk Management and Operational Performance of Hospitality Enterprises – A Case Study in the North Central Region of Vietnam
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1