A. Sekiguchi, M. Hanabata, H. Minami, Y. Matsumoto, Yosuke Ohta, Fucheng Wang, Martin Z Ma, Zhiqiang Su
{"title":"The Synthesis of the High Resolution i Line Novolak Resist","authors":"A. Sekiguchi, M. Hanabata, H. Minami, Y. Matsumoto, Yosuke Ohta, Fucheng Wang, Martin Z Ma, Zhiqiang Su","doi":"10.2494/photopolymer.35.327","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":0,"journal":{"name":"","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.2494/photopolymer.35.327","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}