Thermally induced interface bond failure of nickel deposited on aluminium

L. Révay
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引用次数: 1

Abstract

Annealing in the range 225–550 °C increases the bonding forces between Ni-Al couples. Compressive stresses arise in nickel deposits owing to the different thermal expansion. However, the increase of annealing time reduces the stress level until bond failure initiates. The apparent bonding energy is estimated as 0.7 eV.

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铝表面镍的热致界面粘结破坏
在225-550°C范围内退火增加了Ni-Al对之间的结合力。在镍矿床中,由于不同的热膨胀而产生压应力。然而,退火时间的增加降低了应力水平,直到粘结破坏开始。表观键能估计为0.7 eV。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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