Tomoya Yoshida, Y. Atsumi, E. Omoda, Y. Sakakibara
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引用次数: 3
Abstract
Vertically-curved Si waveguide fabricated using 45nm-node ArF-immersion lithography and ion implantation bending method showed <2.5dB minimum coupling loss, >130nm/0.5dB spectrum bandwidth for 5μm-MFD fiber coupling in both TE- and TM-polarization with very small polarization dependence.
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