Epitaxy at {111}fcc/{110}bcc metal interfaces

Jan H. Van Der Merwe, M.W.H. Braun
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引用次数: 22

Abstract

This paper reviews a theory that justifies “lattice match” assumptions in epitaxy and the application of the theory to epitaxy at {111}fcc/{110}bcc metal interfaces. The basic assumptions of the model are (i) that the adatom-substrate interaction has the periodicity and symmetry of the substrate surface, (ii) that the overlayer is crystalline, (iii) that the adatom-adatom interaction is harmonic and (iv) that the ideal epitaxial configurations are the same as for rigid half crystals. The theory correlates epitaxy with lattice match and predicts the occurrence of the Nishiyama-Wassermann and Kurdjumov-Sachs orientations in thick overlayers with astonishing accuracy. In thin overlayers there is good qualitative agreement with empirical data. The theory stresses the need for quantifying the Fourier coefficients.

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{111}fcc/{110}bcc金属界面的外延
本文综述了在{111}fcc/{110}bcc金属界面外延中证明“晶格匹配”假设的理论以及该理论在外延中的应用。该模型的基本假设是:(i) adatom-adatom相互作用具有衬底表面的周期性和对称性,(ii)覆盖层是结晶的,(iii) adatom-adatom相互作用是谐波的,(iv)理想的外延结构与刚性半晶体相同。该理论将外延与晶格匹配联系起来,并以惊人的精度预测了厚覆层中Nishiyama-Wassermann和Kurdjumov-Sachs取向的发生。在薄覆盖层中,与经验数据有很好的定性一致性。该理论强调了量化傅里叶系数的必要性。
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