Deposition and Properties of Thin PECVD Carbon Films After Rapid Thermal Annealing

G. Beshkov, D. Dimitrov, S. Georgiev, T. Dimitrova
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Abstract

In this work the properties of PECVD-carbon films before and after Rapid Thermal Annealing (RTA) are presented. The thickness of the investigated films is in the range 50 - 6000A. The layers are annealed at 1400°C for different times of 1s to 3 min in vacuum 5 x 10 -5 Torr. Raman investigation has been performed before and after annealing.
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快速热退火后PECVD薄碳膜的沉积与性能研究
本文研究了pecvd -碳薄膜在快速热退火(RTA)前后的性能。所研究薄膜的厚度在50 - 6000A之间。在真空5 × 10 -5 Torr下,在1400°C下退火1 ~ 3 min。在退火前后分别进行了拉曼研究。
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