{"title":"Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review","authors":"Nan Lin, Yunyi Chen, Xin Wei, Wenhe Yang, Y. Leng","doi":"10.1017/hpl.2023.53","DOIUrl":null,"url":null,"abstract":"Abstract With the development of high-volume manufacturing for very-large-scale integrated circuits, the purity of the light source in the extreme ultraviolet lithography (EUVL) system needs to fulfil extreme requirements in order to avoid thermal effect, optical distortion and critical dimension errors caused by out-of-band radiations. This paper reviews the key technologies and developments of the spectral purity systems for both a free-standing system and a built-in system integrated with the collector. The main challenges and developing trends are also discussed, with a view towards practical applications for further improvement. Designing and manufacturing spectral purity systems for EUVL is not a single task; rather, it requires systematic considerations for all relevant modules. Moreover, the requirement of spectral purity filters drives the innovation in filtering technologies, optical micromachining and advanced metrology.","PeriodicalId":54285,"journal":{"name":"High Power Laser Science and Engineering","volume":"7 1","pages":""},"PeriodicalIF":5.2000,"publicationDate":"2023-06-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"High Power Laser Science and Engineering","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1017/hpl.2023.53","RegionNum":1,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"OPTICS","Score":null,"Total":0}
引用次数: 0
Abstract
Abstract With the development of high-volume manufacturing for very-large-scale integrated circuits, the purity of the light source in the extreme ultraviolet lithography (EUVL) system needs to fulfil extreme requirements in order to avoid thermal effect, optical distortion and critical dimension errors caused by out-of-band radiations. This paper reviews the key technologies and developments of the spectral purity systems for both a free-standing system and a built-in system integrated with the collector. The main challenges and developing trends are also discussed, with a view towards practical applications for further improvement. Designing and manufacturing spectral purity systems for EUVL is not a single task; rather, it requires systematic considerations for all relevant modules. Moreover, the requirement of spectral purity filters drives the innovation in filtering technologies, optical micromachining and advanced metrology.
期刊介绍：
High Power Laser Science and Engineering (HPLaser) is an international, peer-reviewed open access journal which focuses on all aspects of high power laser science and engineering.
HPLaser publishes research that seeks to uncover the underlying science and engineering in the fields of high energy density physics, high power lasers, advanced laser technology and applications and laser components. Topics covered include laser-plasma interaction, ultra-intense ultra-short pulse laser interaction with matter, attosecond physics, laser design, modelling and optimization, laser amplifiers, nonlinear optics, laser engineering, optical materials, optical devices, fiber lasers, diode-pumped solid state lasers and excimer lasers.
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