Hydrogen mobility parameters and dislocation pinning rates at very low temperatures in tantalum

J. Lauzier, J. Hillairet, A. Vieux-Champagne, H. Schultz
{"title":"Hydrogen mobility parameters and dislocation pinning rates at very low temperatures in tantalum","authors":"J. Lauzier, J. Hillairet, A. Vieux-Champagne, H. Schultz","doi":"10.1088/0305-4608/18/12/005","DOIUrl":null,"url":null,"abstract":"Pinning rates of dislocations by hydrogen and deuterium have been analysed in monocrystalline tantalum samples of ultrahigh purity. For this purpose, measurements of internal friction and elastic modulus were performed down to 2 K, using a vibrating strip system. A marked pinning stage located between 8 K and 11 K was revealed for hydrogen. The authors show that it reflects the arrival of the hydrogen atoms at dislocation sites, resulting in the pinning of the dislocation kinks. The inferred jump rate of hydrogen atoms is 3*102+or-1 s-1 at 8.3 K. The temperature dependence of diffusion was found to obey a power law, with a large exponent, 15+or-3. Deuterium migration was also detected, at around 14 K. The results obtained are compared with previous data at higher or similar temperatures and discussed in relation to the existing theories for quantum diffusion.","PeriodicalId":16828,"journal":{"name":"Journal of Physics F: Metal Physics","volume":"48 1","pages":"2529-2544"},"PeriodicalIF":0.0000,"publicationDate":"1988-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Physics F: Metal Physics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/0305-4608/18/12/005","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

Pinning rates of dislocations by hydrogen and deuterium have been analysed in monocrystalline tantalum samples of ultrahigh purity. For this purpose, measurements of internal friction and elastic modulus were performed down to 2 K, using a vibrating strip system. A marked pinning stage located between 8 K and 11 K was revealed for hydrogen. The authors show that it reflects the arrival of the hydrogen atoms at dislocation sites, resulting in the pinning of the dislocation kinks. The inferred jump rate of hydrogen atoms is 3*102+or-1 s-1 at 8.3 K. The temperature dependence of diffusion was found to obey a power law, with a large exponent, 15+or-3. Deuterium migration was also detected, at around 14 K. The results obtained are compared with previous data at higher or similar temperatures and discussed in relation to the existing theories for quantum diffusion.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
低温下钽中氢迁移率参数和位错钉钉率
对超高纯度单晶钽样品中氢和氘的位错钉钉率进行了分析。为此,使用振动条系统测量了2 K以下的内摩擦和弹性模量。氢在8k和11k之间有一个明显的钉住阶段。作者表明,它反映了氢原子到达位错位置,导致位错扭结的钉住。在8.3 K时,氢原子的跃迁速率为3*102+or-1 s-1。扩散的温度依赖性服从幂律,指数较大,为15+或3。在14k左右也检测到氘的迁移。所得结果与先前在较高或相似温度下的数据进行了比较,并与现有的量子扩散理论进行了讨论。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Electrical resistivity and magnetoresistance in Fe-B-C amorphous alloys Temperature dependence of the elastic constants of La3S4 Influence of interface scattering on the resistance of polycrystalline Au/Pd multilayered thin films The atomic and electronic structure of metallic glasses: search for a structure-induced minimum in the density of states Electronic density of states in pseudobinary compounds. II. The effect of off-diagonal randomness
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1