K. Schmidt-Szałowski, Z. Rżanek-Boroch, J. Sentek, Z. Rymuza, Z. Kusznierewicz, M. Misiak
{"title":"Thin Films Deposition from Hexamethyldisiloxane and Hexamethyldisilazane under Dielectric-Barrier Discharge (DBD) Conditions","authors":"K. Schmidt-Szałowski, Z. Rżanek-Boroch, J. Sentek, Z. Rymuza, Z. Kusznierewicz, M. Misiak","doi":"10.1023/A:1011314420080","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":20249,"journal":{"name":"Plasmas and Polymers","volume":"62 1","pages":"173-190"},"PeriodicalIF":0.0000,"publicationDate":"2000-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"80","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasmas and Polymers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1023/A:1011314420080","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
