Dihydroxy-hexahelicene in Thin Films; Structural Characterization and Photoelectrochemical Properties

Abstract

ACKNOWLEDGEMENTS The authors would like to thank the staff of TIARA accelerators at Takasaki Advanced Radiation Research Institute, National Institutes for Quantum and Radiological Science for operating the tandem accelerator. They also thank Y. Matsuda for the GIXD measurements. The present study has been carried out under the collaboration program between Osaka Prefecture University, and National Institutes for Quantum and Radiological Science, and the collaboration program between Osaka Prefecture University and TransRegional Corporation Center for Industrial Materials Research, Institute for Materials Research, Tohoku University