Influence of H+ ion on microstructure and electrochemical behavior passive film formed on stainless steel-304 in low concentrated sulfuric acids

R. Natarajan
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Abstract

The investigation focused toward microstructure and electrochemical changes caused by proton on a passive film formed on the surface of stainless steel-304 in lower concentrated sulfuric acid solutions (exclusively 0.5, 1.0, 2.0, and 5.0 N concentrations). Dissociation rate of the proton in the acid was reduced due to increasing of acid concentration from 0.5 to 5.0 N, which causes anodic shift at open circuit potential region and cathodic shift in different passivation potential regions. Proton enhances different electrochemical behaviors such as activation, primary, secondary passive, and transpassive behaviors, which was concluded by increasing of current value in these regions. AC impedance parameters such as double layer capacitance ( C dl ), charge transfer resistance ( R ct ) are compared with selective polarization parameters. Microstructure and chemical entities present in the passive film were examined through scanning electron microscopy and X-ray photoelectron spectroscopic techniques. The role of H+ and SO42- ion on metal dissolution and passive film formation have been discussed.
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低浓硫酸中H+离子对不锈钢-304表面微观结构及电化学行为的影响
研究了在低浓度硫酸溶液(分别为0.5、1.0、2.0和5.0 N浓度)中,质子作用于不锈钢-304表面钝化膜的微观结构和电化学变化。当酸浓度从0.5 N增加到5.0 N时,质子在酸中的解离速率降低,导致开路电位区域的阳极偏移和不同钝化电位区域的阴极偏移。质子增强了不同的电化学行为,如活化、初级、次级被动和传递行为,这是通过增加这些区域的电流值得出的。将双层电容(cdl)、电荷转移电阻(rct)等交流阻抗参数与选择性极化参数进行了比较。通过扫描电子显微镜和x射线光电子能谱技术研究了钝化膜的微观结构和化学成分。讨论了H+和SO42-离子在金属溶解和钝化膜形成中的作用。
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