{"title":"A novel high Q variable width differential series stacked spiral inductor","authors":"Sunilkumar Tumma, N. Rao","doi":"10.1109/ICCCNT.2017.8203906","DOIUrl":null,"url":null,"abstract":"In this paper a variable width Differential Series Stacked Spiral Inductor is proposed. The proposed inductor is implemented using multilayers by gradually decreasing metal width from top layer to bottom layer. The variation in metal width decreases the series resistance of the inductor that increases the Quality factor. The Increase in metal strip length increases the Inductance. The proposed inductor is designed and simulated by using High Frequency Structural Simulator (HFSS) for 0.18μm CMOS Technology. The simulation results have shown 35% improvement in inductance value and 30% improvement in Quality factor without changing the Self Resonant Frequency when compared with Standard Differential inductor of same on chip area.","PeriodicalId":6581,"journal":{"name":"2017 8th International Conference on Computing, Communication and Networking Technologies (ICCCNT)","volume":"2 1","pages":"1-5"},"PeriodicalIF":0.0000,"publicationDate":"2017-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 8th International Conference on Computing, Communication and Networking Technologies (ICCCNT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICCCNT.2017.8203906","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
In this paper a variable width Differential Series Stacked Spiral Inductor is proposed. The proposed inductor is implemented using multilayers by gradually decreasing metal width from top layer to bottom layer. The variation in metal width decreases the series resistance of the inductor that increases the Quality factor. The Increase in metal strip length increases the Inductance. The proposed inductor is designed and simulated by using High Frequency Structural Simulator (HFSS) for 0.18μm CMOS Technology. The simulation results have shown 35% improvement in inductance value and 30% improvement in Quality factor without changing the Self Resonant Frequency when compared with Standard Differential inductor of same on chip area.