{"title":"A Study of CVD of Gallium Nitride Films by In Situ Gas-Phase UV Spectroscopy","authors":"S. Alexandrov, A. Kovalgin, D. Krasovitskiy","doi":"10.1051/JPHYSCOL:1995520","DOIUrl":null,"url":null,"abstract":"Direct in situ UV spectroscopic analysis of the gas phase was performed during chemical vapour deposition of gallium nitride films based on pyrolysis of GaCl 3 NH 3 complexes. The most probable mechanism of film formation is proposed on the basis of the experimental results obtained.","PeriodicalId":17944,"journal":{"name":"Le Journal De Physique Colloques","volume":"4 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"1995-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Le Journal De Physique Colloques","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1051/JPHYSCOL:1995520","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Direct in situ UV spectroscopic analysis of the gas phase was performed during chemical vapour deposition of gallium nitride films based on pyrolysis of GaCl 3 NH 3 complexes. The most probable mechanism of film formation is proposed on the basis of the experimental results obtained.
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