{"title":"The effects of boron in TiAl/Ti3Al","authors":"C.R. Feng, D.J. Michel, C.R. Crowe","doi":"10.1016/0036-9748(89)90347-5","DOIUrl":null,"url":null,"abstract":"<div><p>The TiAl/Ti<sub>3</sub>Al interfacial misfit dislocations structures were investigated by TEM in Ti-45Al alloy and Ti-45Al/TiB<sub>2</sub> composite. For TiAl with c/a = 1.02, only a single set of misfit dislocation arrays are crystallographically possible; these were observed in Ti-45Al alloy. However, the observation of three sets of misfit dislocation arrays in the Ti-45Al/TiB<sub>2</sub> composite suggests that the occupation of octahedral sites in the TiAl structure by excess boron was responsible for a decrease in the c/a ratio leading to an increased fcc character of the TiAl at the TiAl/Ti<sub>3</sub>Al interface.</p></div>","PeriodicalId":21604,"journal":{"name":"Scripta Metallurgica","volume":"23 10","pages":"Pages 1707-1711"},"PeriodicalIF":0.0000,"publicationDate":"1989-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0036-9748(89)90347-5","citationCount":"19","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Scripta Metallurgica","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0036974889903475","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 19
Abstract
The TiAl/Ti3Al interfacial misfit dislocations structures were investigated by TEM in Ti-45Al alloy and Ti-45Al/TiB2 composite. For TiAl with c/a = 1.02, only a single set of misfit dislocation arrays are crystallographically possible; these were observed in Ti-45Al alloy. However, the observation of three sets of misfit dislocation arrays in the Ti-45Al/TiB2 composite suggests that the occupation of octahedral sites in the TiAl structure by excess boron was responsible for a decrease in the c/a ratio leading to an increased fcc character of the TiAl at the TiAl/Ti3Al interface.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
